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Proceedings Paper

Research of the relations between monolayer SiNx optical thin film processing techniques and laser-induced damage properties prepared by PECVD technology
Author(s): Peng Li; Lingxia Hang; Linjun Li; Fabin Huang
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Paper Abstract

The monolayer SiNx optical thin films were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technology on the BK7 glass substrate, the laser-induced damage threshold was measured by laser damage testing equipment, and we also investigated the relations between processing techniques and laser-induced damage properties. The study and analysis to orthogonal experiment results show that PECVD processing techniques have an effect on the laser-induced damage properties. Among them,radio frequency has the biggest effection, temperature is the main factor, working pressure is the unimportant factor, and we also achieve the optimal processing parameters (Temperature is 350℃; RF power is 250W; Working pressure is 60Pa).

Paper Details

Date Published: 19 February 2015
PDF: 9 pages
Proc. SPIE 9449, The International Conference on Photonics and Optical Engineering (icPOE 2014), 944919 (19 February 2015); doi: 10.1117/12.2075790
Show Author Affiliations
Peng Li, Xi'an Technological Univ. (China)
Lingxia Hang, Xi'an Technological Univ. (China)
Linjun Li, Xi'an Technological Univ. (China)
Fabin Huang, Xi'an Technological Univ. (China)


Published in SPIE Proceedings Vol. 9449:
The International Conference on Photonics and Optical Engineering (icPOE 2014)
Ailing Tian; Anand Asundi; Weiguo Liu; Chunmin Zhang, Editor(s)

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