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Proceedings Paper

Development of optical inspection system for detecting malfunctions of digital micromirror device
Author(s): Minwook Kang; Dong Won Kang; Wondong Lee; Jae W. Hahn
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Paper Abstract

Maskless lithography (ML) systems have been researched as an alternative technologies of the conventional photolithography systems. Digital micromirror devices (DMD) can be used in ML systems as a role of photomask in the conventional photolithography systems. For high-throughput manufacturing processes DMDs in ML systems must be driven to their operational limits, often in harsh conditions. We propose an optical system and detection methodologies to detect DMD malfunctions to ensure perfect mask image transfer to the photoresist in ML systems. We categorize DMD malfunctions into two types. One is bad DMD pixel caused from mechanical defect and the other is data transfer error. We detect bad DMD pixels with 20×20 pixels using white and black image tests. We confirm data transfer errors at high frame rate operation of DMD by monitoring changes in the frame rate of a target DMD pixel driven by the input data with a set frame rate of up to 28,000 frames per second (fps).

Paper Details

Date Published: 9 January 2015
PDF: 6 pages
Proc. SPIE 9444, International Seminar on Photonics, Optics, and Its Applications (ISPhOA 2014), 944417 (9 January 2015); doi: 10.1117/12.2075175
Show Author Affiliations
Minwook Kang, Yonsei Univ. (Korea, Republic of)
Dong Won Kang, Yonsei Univ. (Korea, Republic of)
Wondong Lee, Yonsei Univ. (Korea, Republic of)
Jae W. Hahn, Yonsei Univ. (Korea, Republic of)


Published in SPIE Proceedings Vol. 9444:
International Seminar on Photonics, Optics, and Its Applications (ISPhOA 2014)
Aulia Nasution, Editor(s)

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