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Proceedings Paper

Dry etching for the fabrication of flat panel displays
Author(s): Curt Barratt; David J. Johnson; Chris Constantine
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Paper Abstract

The technique of dry etching as applied to the patterning of thin films is described, and compared to wet etching in terms of the etch precision and in terms of the usage and disposal of etch chemicals. The etch requirements of three representative display technologies (AMLCD, FED and EL) are outlined, and the range of plasma etch processes which are applicable to these requirements is described.

Paper Details

Date Published: 24 April 1995
PDF: 5 pages
Proc. SPIE 2408, Liquid Crystal Materials, Devices, and Displays, (24 April 1995); doi: 10.1117/12.207515
Show Author Affiliations
Curt Barratt, Plasma-Therm, Inc. (United States)
David J. Johnson, Plasma-Therm, Inc. (United States)
Chris Constantine, Plasma-Therm, Inc. (United States)


Published in SPIE Proceedings Vol. 2408:
Liquid Crystal Materials, Devices, and Displays
Ranganathan Shashidhar; Uzi Efron, Editor(s)

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