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Proceedings Paper

Illumination in Microlithography
Author(s): Daniel G. Smith
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Paper Abstract

Illumination has been a critical factor to producing good imaging in microlithography since the beginning. Early lithographers used very simple illumination schemes, but as they improved their understanding of how the illumination influences image fidelity and resolution they moved into more complex partially coherent illumination conditions. Today, lithographers deploy many tricks with coherence and polarization that are tightly coupled with the patterns being imaged to help achieve seemingly impossible resolutions well below the classical definition. In this talk we review the progress of illumination engineering in microlithography up to the present.

Paper Details

Date Published: 17 December 2014
PDF: 9 pages
Proc. SPIE 9293, International Optical Design Conference 2014, 92931G (17 December 2014); doi: 10.1117/12.2074914
Show Author Affiliations
Daniel G. Smith, Nikon Research Corp. of America (United States)


Published in SPIE Proceedings Vol. 9293:
International Optical Design Conference 2014
Mariana Figueiro; Scott Lerner; Julius Muschaweck; John Rogers, Editor(s)

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