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Proceedings Paper

NIR high-efficiency subwavelength diffractive structures in semiconductors
Author(s): Robert E. Smith; Mial E. Warren; Joel R. Wendt; G. Allen Vawter
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Paper Abstract

We have fabricated sub-wavelength diffractive optical elements with binary phase profiles for operation at 975 nm. Blazed transmission gratings with minimum features 63 nm wide were designed by using rigorous coupled-wave analysis and fabricated by direct-write e-beam lithography and reactive ion beam etching in gallium arsenide. Transmission measurements show 85% diffraction efficiency into the first order. Anti-reflection surfaces, with features 42 nm wide were also designed and fabricated.

Paper Details

Date Published: 20 April 1995
PDF: 7 pages
Proc. SPIE 2404, Diffractive and Holographic Optics Technology II, (20 April 1995); doi: 10.1117/12.207462
Show Author Affiliations
Robert E. Smith, Sandia National Labs. (United States)
Mial E. Warren, Sandia National Labs. (United States)
Joel R. Wendt, Sandia National Labs. (United States)
G. Allen Vawter, Sandia National Labs. (United States)

Published in SPIE Proceedings Vol. 2404:
Diffractive and Holographic Optics Technology II
Ivan Cindrich; Sing H. Lee, Editor(s)

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