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Proceedings Paper

Inductively coupled plasmas (ICP) etching of PZT thin films for fabricating optical waveguide with photoresist/aluminum bilayer masking
Author(s): Zhipeng Qi; Guohua Hu; Qin Zhu; Lixing Zhang; Manqing Li; Yiping Cui
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Paper Abstract

Waveguide morphology, as well as etched surface, is one of the most important factors deciding the performance of optical waveguide devices. In this work, we present a combination using photoresist/aluminum bilayer mask for the ICP etching of PZT (Pb(Zr1-xTix)O3) thin films. The etching results of PZT thin films with different etching methods and various etching conditions were investigated. It was found that using ICP in 30/10sccm CHF3/Ar mixture and 3Pa could help reduce the defects and contaminations on the etched surface of PZT thin films. Compared with 250W/60W dual- electrode ICP etching, a more vertical etch profile of PZT waveguide could be obtained through 100W single-electrode ICP etching under the optimal conditions.

Paper Details

Date Published: 27 February 2015
PDF: 9 pages
Proc. SPIE 9365, Integrated Optics: Devices, Materials, and Technologies XIX, 93650Z (27 February 2015); doi: 10.1117/12.2074608
Show Author Affiliations
Zhipeng Qi, Southeast Univ. (China)
Guohua Hu, Southeast Univ. (China)
Qin Zhu, Southeast Univ. (China)
Lixing Zhang, Southeast Univ. (China)
Manqing Li, Southeast Univ. (China)
Yiping Cui, Southeast Univ. (China)


Published in SPIE Proceedings Vol. 9365:
Integrated Optics: Devices, Materials, and Technologies XIX
Jean-Emmanuel Broquin; Gualtiero Nunzi Conti, Editor(s)

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