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Proceedings Paper

193 nm scatterfield microscope illumination optics
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Paper Abstract

A scatterfield microscope for deep sub-wavelength semiconductor metrology using 193 nm light has been designed. In addition to accommodating the fixed numerical aperture and size of its commercial catadioptric objective lens, the illumination optics are formed to implement essential parameters necessary for angular illumination control at the sample plane. This angle-resolved scatterfield microscope requires access to a relatively large (> 10 mm) conjugate back focal plane as well as increased fluence from the ArF excimer laser source. The parametric optimization process yielded a telecentric conjugate back focal plane with appropriate numerical aperture and diameter by adjustment of the parameters of two interrelated lens groups.

Paper Details

Date Published: 17 December 2014
PDF: 6 pages
Proc. SPIE 9293, International Optical Design Conference 2014, 92931D (17 December 2014); doi: 10.1117/12.2074211
Show Author Affiliations
Martin Y. Sohn, National Institute of Standards and Technology (United States)
Richard M. Silver, National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 9293:
International Optical Design Conference 2014
Mariana Figueiro; Scott Lerner; Julius Muschaweck; John Rogers, Editor(s)

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