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Proceedings Paper

Fabrication of nano-pillar with sub-100nm resolution based on thiol-ene
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Paper Abstract

This paper demonstrates an approach to fabricate nano-pillar based on thiol-ene via soft-lithography. The template is anodic aluminum oxygen (AAO) with ordered nano-holes with the diameter of 90nm.The nano-pillar consists of rigid thiol-ene features on an elastic poly(dimethylsiloxane) (PDMS) support. It is capable of patterning both flat and curved substrate. The thiol-ene is a new green UV-curable polymer material, including a number of advantages such as rapid UV-curing in the natural environment, low-cost, high resolution, and regulative performance characteristic. Here, we fabricated a two-layer structure, which included rigid thiol-ene nano-pillar with sub-100nm resolution and soft PDMS substrate. The experiment results show that this approach can be used to fabricate high-resolution features and the thiol-ene is an excellent imprint material. The fabrication technique in this paper is simple, low-cost, high-resolution and easy to high throughput, which has broad application prospects in the preparation of nanostructures.

Paper Details

Date Published: 13 November 2014
PDF: 7 pages
Proc. SPIE 9277, Nanophotonics and Micro/Nano Optics II, 92771U (13 November 2014); doi: 10.1117/12.2073892
Show Author Affiliations
Man Zhang, Institute of Optics and Electronics (China)
Qiling Deng, Institute of Optics and Electronics (China)
Lifang Shi, Institute of Optics and Electronics (China)
Hui Pang, Institute of Optics and Electronics (China)
Axiu Cao, Institute of Optics and Electronics (China)
Song Hu, Institute of Optics and Electronics (China)

Published in SPIE Proceedings Vol. 9277:
Nanophotonics and Micro/Nano Optics II
Zhiping Zhou; Kazumi Wada, Editor(s)

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