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Proceedings Paper

Polarization aberration function for perturbed lithographic lens
Author(s): Wei Huang; Xiangru Xu; Mingfei Xu; Weicai Xu; Zhaoxin Tang
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Paper Abstract

A comprehensive polarization aberration function is proposed to evaluate the imaging quality of a perturbed high NA lithographic lens. In this function, the system polarization aberration, i.e. Jones matrix, is decomposed into several basic parts as wavefront aberration, apodization, diattenuation, retardance and rotation by single value decomposition (SVD). The wavefront aberration is described by field-Zernike polynomials (FZP), and the diattenuation, as well as retardance, is described by field-orientation Zernike polynomials (FOZP). The relationship of system polarization aberration with pupil, field and manufacturing errors is established by an approximately analytical equation, which provides a possible way to analyze lens tolerance for polarization aberration.

Paper Details

Date Published: 5 November 2014
PDF: 15 pages
Proc. SPIE 9272, Optical Design and Testing VI, 92720G (5 November 2014); doi: 10.1117/12.2073629
Show Author Affiliations
Wei Huang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
State Key Lab. of Applied Optics (China)
Xiangru Xu, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Univ. of Chinese Academy of Sciences (China)
Mingfei Xu, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Univ. of Chinese Academy of Sciences (China)
Weicai Xu, Changchun Institute of Optics, Fine Mechanics and Physics (China)
State Key Lab. of Applied Optics (China)
Zhaoxin Tang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Univ. of Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 9272:
Optical Design and Testing VI
Yongtian Wang; Chunlei Du; José Sasián; Kimio Tatsuno, Editor(s)

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