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Proceedings Paper

Nanofabrication with sub-50nm features by imprinting-induced cracks
Author(s): Liangping Xia; Man Zhang; Zheng Yang; Shaoyun Yin; Chunlei Du
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Paper Abstract

Nanofabrication is the foundation of nanophotonics and has become a research hotspot in the last decades. The method annealing crack is proposed to transfer the nanocracks from ultraviolet (UV) resist to other photonic materials. The method is demonstrated by simulating the inner stress distribution with the thermal-structure analysis. In addition, the parameter influence to the maximum stress is discussed and the results indicate that the annealing temperature has a large effect. The method is simple, low cost, high efficiency and is a good candidate to fabricate nanophotonic structures with critical size less than 50nm.

Paper Details

Date Published: 5 November 2014
PDF: 5 pages
Proc. SPIE 9272, Optical Design and Testing VI, 92720K (5 November 2014); doi: 10.1117/12.2073501
Show Author Affiliations
Liangping Xia, Chongqing Institute of Green and Intelligent Technology (China)
Man Zhang, Institute of Optics and Electronics (China)
Zheng Yang, Chongqing Institute of Green and Intelligent Technology (China)
Shaoyun Yin, Chongqing Institute of Green and Intelligent Technology (China)
Chunlei Du, Chongqing Institute of Green and Intelligent Technology (China)


Published in SPIE Proceedings Vol. 9272:
Optical Design and Testing VI
Yongtian Wang; Chunlei Du; José Sasián; Kimio Tatsuno, Editor(s)

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