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Proceedings Paper

Trends in mask data preparation
Author(s): Aki Fujimura; Liyong Pang; Bo Su; Yohan Choi
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Paper Abstract

Whether for VSB mask writing or for multibeam mask writing, the shapes we need to write on masks are increasingly complex, increasingly curvilinear, and smaller in minimum width and space. The overwhelming trend in mask data preparation (MDP) is the shift from deterministic, rule-based, geometric, context-independent, shape-modulated, rectangular processing to statistical, simulation-based, context-dependent, dose- and shape-modulated any-shape processing. The paper briefly surveys the history of MDP, and explains through a simulation-based study that 50nm line and space is the tipping point where rule-based processing gives away to simulation-based processing.

Paper Details

Date Published: 8 October 2014
PDF: 11 pages
Proc. SPIE 9235, Photomask Technology 2014, 923508 (8 October 2014); doi: 10.1117/12.2073368
Show Author Affiliations
Aki Fujimura, D2S, Inc. (United States)
Liyong Pang, D2S, Inc. (United States)
Bo Su, D2S, Inc. (United States)
Yohan Choi, D2S, Inc. (United States)


Published in SPIE Proceedings Vol. 9235:
Photomask Technology 2014
Paul W. Ackmann; Naoya Hayashi, Editor(s)

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