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Proceedings Paper

Diffractive optical elements: fabrication and application
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Paper Abstract

We review our recent progress on development of the methods for fabrication of precision binary and as well as highefficiency continuous-relief diffractive optical elements (DOEs) by combining complementary advantages of circular laser writing system (CLWS), direct laser beam writing in thermal and photo-sensitive materials and analog lithography. The main limitation and tolerances of writing methods are identified, and their influence on optical performance of DOEs is investigated. The latest results of fabrication and practical applications of DOEs with more than 200 mm diameter and a minimum feature size of 0.5 micrometer for testing large aspheric surfaces with a Fizeau-type interferometer are presented.

Paper Details

Date Published: 21 August 2014
PDF: 11 pages
Proc. SPIE 9283, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 928302 (21 August 2014); doi: 10.1117/12.2073301
Show Author Affiliations
A. G. Poleshchuk, Institute of Automation and Electrometry (Russian Federation)
V. P. Korolkov, Institute of Automation and Electrometry (Russian Federation)
R. K. Nasyrov, Institute of Automation and Electrometry (Russian Federation)


Published in SPIE Proceedings Vol. 9283:
7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Tianchun Ye; A. G. Poleshchuk; Song Hu, Editor(s)

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