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Proceedings Paper

Nonlinearity properties of a phthalocyanine film researching by top-hat Z-scan techniques
Author(s): Wei-wei Wu; Jun-yi Yang; Ying-lin Song
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Paper Abstract

The third-order nonlinear refractive response in a kind of thin phthalocyanine film has been investigated using two types of top-hat Z-scan techniques with a picoseconds pulses laser at wavelength of 532nm. The nonlinear phase shift of this sample is so week because of the very small thickness of the films, and the normal top-hat Z-scan technique is often difficult to measure the results. To research the nonlinear response of this thin film, we also has been measured it using the modified top-hat Z-scan technique under the experimental conditions of the same. The curve of the modified top-hat Z-scan for the nonlinear refraction is only a single peak and the result shows this kind of film has obvious response of nonlinear refraction with 19 picoseconds pulses. Furthermore, we have been carried on the theoretical analysis and the numerical simulation with the result of the experiment, and the theoretical simulation fit well with experimental results, the value of the nonlinear refraction index is obtained to be n2 = 6.25×10−15 m2 /W . By comparing the measured curve of the two, the results indicate that the sensitivity of the modified top-hat Z-scan measurement is greatly enhanced.

Paper Details

Date Published: 3 December 2014
PDF: 6 pages
Proc. SPIE 9297, International Symposium on Optoelectronic Technology and Application 2014: Laser and Optical Measurement Technology; and Fiber Optic Sensors, 92971O (3 December 2014); doi: 10.1117/12.2073039
Show Author Affiliations
Wei-wei Wu, Soochow Univ. (China)
Jun-yi Yang, Soochow Univ. (China)
Ying-lin Song, Soochow Univ. (China)
Harbin Institute of Technology (China)


Published in SPIE Proceedings Vol. 9297:
International Symposium on Optoelectronic Technology and Application 2014: Laser and Optical Measurement Technology; and Fiber Optic Sensors
Jurgen Czarske; Shulian Zhang; David Sampson; Wei Wang; Yanbiao Liao, Editor(s)

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