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Proceedings Paper

Mask data processing in the era of multibeam writers
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Paper Abstract

Mask writers’ architectures have evolved through the years in response to ever tightening requirements for better resolution, tighter feature placement, improved CD control, and tolerable write time. The unprecedented extension of optical lithography and the myriad of Resolution Enhancement Techniques have tasked current mask writers with ever increasing shot count and higher dose, and therefore, increasing write time. Once again, we see the need for a transition to a new type of mask writer based on massively parallel architecture. These platforms offer a step function improvement in both dose and the ability to process massive amounts of data. The higher dose and almost unlimited appetite for edge corrections open new windows of opportunity to further push the envelope. These architectures are also naturally capable of producing curvilinear shapes, making the need to approximate a curve with multiple Manhattan shapes unnecessary.

Paper Details

Date Published: 21 October 2014
PDF: 19 pages
Proc. SPIE 9235, Photomask Technology 2014, 92350W (21 October 2014); doi: 10.1117/12.2072135
Show Author Affiliations
Frank E. Abboud, Intel Corp. (United States)
Michael Asturias, Intel Corp. (United States)
Maesh Chandramouli, Intel Corp. (United States)
Yoshihiro Tezuka, Intel Kabushiki Kaisha (Japan)


Published in SPIE Proceedings Vol. 9235:
Photomask Technology 2014
Paul W. Ackmann; Naoya Hayashi, Editor(s)

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