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Proceedings Paper

A high-accuracy subaperture stitching system for nonflatness measurement of wafer stage mirror
Author(s): Yunjun Lu; Feng Tang; Xiangzhao Wang; Yong Li; Xiulong Wan; Fudong Guo; Fengzhao Dai
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Paper Abstract

Nonflatness of stage mirror surface affects the position accuracy of the wafer stage in lithography tool. Precise surface flatness measurement is needed for the computer controlled polishing of stage mirror. A subaperture stitching system using a commercial 4-inch Fizeau interferometer was presented in this paper. Absolute test was used to calibrate the surface figure of the reference mirror with the accuracy better than λ/100 PV (λ = 632.8nm). Subaperture stitching was used to extend the measurement aperture larger than 450×50mm. Stitching measurements were carried out for stage mirrors during surface polishing. Comparison tests were also made with a 24-inch interferometer. The results show that the stitching system has the advantages of larger dynamic range, higher spatial resolution, and better measurement accuracy in local area.

Paper Details

Date Published: 13 November 2014
PDF: 9 pages
Proc. SPIE 9276, Optical Metrology and Inspection for Industrial Applications III, 927617 (13 November 2014); doi: 10.1117/12.2071824
Show Author Affiliations
Yunjun Lu, Shanghai Institute of Optics and Fine Mechanics (China)
Feng Tang, Shanghai Institute of Optics and Fine Mechanics (Japan)
Xiangzhao Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Yong Li, Shanghai Institute of Optics and Fine Mechanics (China)
Xiulong Wan, Shanghai Institute of Optics and Fine Mechanics (China)
Fudong Guo, Shanghai Institute of Optics and Fine Mechanics (China)
Fengzhao Dai, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 9276:
Optical Metrology and Inspection for Industrial Applications III
Sen Han; Toru Yoshizawa; Song Zhang, Editor(s)

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