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Proceedings Paper

Two-dimension lateral shearing interferometry for microscope objective wavefront metrology
Author(s): Zhixiang Liu; Tingwen Xing; Yadong Jiang; Baobin Lv; Fuchao Xu
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Paper Abstract

Lateral shearing interferometry was an attractive technique to measure the wavefront aberration of high numerical aperture microscope objective lens. A two-dimension lateral shearing interferometer based on chessboard grating was designed for microscope objective wavefront metrology. By positioning the chessboard grating at the Talbot distance of the objective focal plane, the wavefront was divided and sheared in two-dimension. By applying two-dimensional Fourier transform method and differential Zernike polynomial fitting, Zernike coefficients of the wavefront were obtained. A 10x, NA0.25 microscope objective was measured at 632.8nm wavelength, the results showed that the wavefront of the objective was 0.755λ PV, 0.172λ RMS, the repeatability(3σ) of RMS at random grating position was 2.3mλ, the repeatability(3σ) of Z5 to Z36 at random grating position were better than 17mλ.

Paper Details

Date Published: 5 November 2014
PDF: 8 pages
Proc. SPIE 9272, Optical Design and Testing VI, 92721B (5 November 2014); doi: 10.1117/12.2071500
Show Author Affiliations
Zhixiang Liu, Institute of Optics and Electronics (China)
Univ. of Electronic Science and Technology of China (China)
Univ. of Chinese Academy of Sciences (China)
Tingwen Xing, Institute of Optics and Electronics (China)
Yadong Jiang, Univ. of Electronic Science and Technology of China (China)
Baobin Lv, Institute of Optics and Electronics (China)
Univ. of Electronic Science and Technology of China (China)
Univ. of Chinese Academy of Sciences (China)
Fuchao Xu, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 9272:
Optical Design and Testing VI
Yongtian Wang; Chunlei Du; José Sasián; Kimio Tatsuno, Editor(s)

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