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Proceedings Paper

Discharge initiated high power repetitively pulsed HF/DF laser
Author(s): Ke Huang; Aiping Yi; Ying Tang; Feng Zhu; Lianying Ma; Chao Huang; Songqing Zhou; Liu Zhao; Guobin Feng; Xisheng Ye; Jingru Liu; Jun Zhao
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Paper Abstract

The design and performance of a closed cycle, repetitively pulsed HF/DF laser is described. For obtained higher stable laser pulse energy and running frequency, discharge stability with different electrode profile and different gas circulation structure are researched. The functional relations of laser pulse energy with electric field strength (E) and gas mixture pressure (P) for various gas flow velocity are studied. It is shown that with preliminary optimized of the gas injection segment structure before pump region and optimal E/P conditions, maximal running frequency of 100Hz is obtained and operating stability keeps well. Under these conditions, the laser average power is 40W and peak power is 4MW.

Paper Details

Date Published: 3 February 2015
PDF: 6 pages
Proc. SPIE 9255, XX International Symposium on High-Power Laser Systems and Applications 2014, 92552X (3 February 2015); doi: 10.1117/12.2071033
Show Author Affiliations
Ke Huang, Northwest Institute of Nuclear Technology (China)
Aiping Yi, Northwest Institute of Nuclear Technology (China)
Ying Tang, Northwest Institute of Nuclear Technology (China)
Feng Zhu, Northwest Institute of Nuclear Technology (China)
Lianying Ma, Northwest Institute of Nuclear Technology (China)
Chao Huang, Northwest Institute of Nuclear Technology (China)
Songqing Zhou, Northwest Institute of Nuclear Technology (China)
Liu Zhao, Northwest Institute of Nuclear Technology (China)
Guobin Feng, Northwest Institute of Nuclear Technology (China)
Xisheng Ye, Northwest Institute of Nuclear Technology (China)
Jingru Liu, Northwest Institute of Nuclear Technology (China)
Jun Zhao, Northwest Institute of Nuclear Technology (China)


Published in SPIE Proceedings Vol. 9255:
XX International Symposium on High-Power Laser Systems and Applications 2014
Chun Tang; Shu Chen; Xiaolin Tang, Editor(s)

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