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Proceedings Paper

Calculation of Mueller matrix for light scattering from randomly rough surface
Author(s): Keding Yan; Shouyu Wang; Shu Jiang; Liang Xue; Yuanyuan Song; Zhengang Yan; Zhenhua Li
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Paper Abstract

Mueller matrix is a useful tool for analyzing polarization characteristics in a wealth of research fields. With Mueller matrix, the modulation effects of samples on polarization could be quantitatively analyzed and discussed. In this paper, all elements in the Mueller matrix are calculated when the lights scatter from one dimensional randomly rough surfaces at different conditions with Kirchhoff approximation method which owns high accuracy and fast calculation speed. Besides, theoretical analysis of the light scattering from randomly rough dielectrics and metal surfaces is also proposed in this paper. Moreover, with both theoretical analysis and numerical simulations, we have explained the variations of all elements in Mueller matrix, more importantly, m34 is highly focused which is quite a significant mark in both randomly rough dielectric and metal surfaces. To our best knowledge, it is the first time this obvious difference is both analyzed and discussed via both theoretical analysis and numerical calculation, and is successfully explained via phase difference between incident and reflective waves. According to the analysis, more information of the target could be obtained in order to determine the characteristics of the target. The paper will be an important reference for polarization imaging in laser radar and remote sensing, etc.

Paper Details

Date Published: 5 November 2014
PDF: 14 pages
Proc. SPIE 9272, Optical Design and Testing VI, 927210 (5 November 2014); doi: 10.1117/12.2070971
Show Author Affiliations
Keding Yan, Nanjing Univ. of Science and Technology (China)
Shouyu Wang, Nanjing Univ. of Science and Technology (China)
Shu Jiang, China Shipbuilding Industry Corp. (China)
Liang Xue, Shanghai Univ. of Electric Power (China)
Yuanyuan Song, China North Vehicle Research Institute (China)
Zhengang Yan, Xi'an Modern Control Technology Research Institute (China)
Zhenhua Li, Nanjing Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 9272:
Optical Design and Testing VI
Yongtian Wang; Chunlei Du; José Sasián; Kimio Tatsuno, Editor(s)

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