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Proceedings Paper

A path planning method used in fluid jet polishing eliminating lightweight mirror imprinting effect
Author(s): Wenzong Li; Bin Fan; Chunyan Shi; Jia Wang; Bin Zhuo
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Paper Abstract

With the development of space technology, the design of optical system tends to large aperture lightweight mirror with high dimension-thickness ratio. However, when the lightweight mirror PV value is less than λ/10 , the surface will show wavy imprinting effect obviously. Imprinting effect introduced by head-tool pressure has become a technological barrier in high-precision lightweight mirror manufacturing. Fluid jet polishing can exclude outside pressure. Presently, machining tracks often used are grating type path, screw type path and pseudo-random path. On the edge of imprinting error, the speed of adjacent path points changes too fast, which causes the machine hard to reflect quickly, brings about new path error, and increases the polishing time due to superfluous path. This paper presents a new planning path method to eliminate imprinting effect. Simulation results show that the path of the improved grating path can better eliminate imprinting effect compared to the general path.

Paper Details

Date Published: 6 August 2014
PDF: 8 pages
Proc. SPIE 9281, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 92811H (6 August 2014); doi: 10.1117/12.2070967
Show Author Affiliations
Wenzong Li, Institute of Optics and Electronics (China)
Univ. of Chinese Academy of Sciences (China)
Bin Fan, Institute of Optics and Electronics (China)
Chunyan Shi, Institute of Optics and Electronics (China)
Jia Wang, Institute of Optics and Electronics (China)
Univ. of Chinese Academy of Sciences (China)
Bin Zhuo, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 9281:
7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Eric Ruch; Shengyi Li, Editor(s)

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