Share Email Print

Proceedings Paper

Optimizing binary dithering patterns to improve phase quality
Author(s): Junfei Dai; Song Zhang
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

This paper intends to thoroughly evaluate the influences of different phase-shifting algorithms, and optimization directions, and initial patterns. For fair comparisons, we used the same number of iterations for optimization and the same size of optimization patches. The variables are optimization domain (i.e., phase and intensity domain), the step number of the phase-shifting algorithm (i.e.. three and four step), the initial pattern (i.e., Bayer dithered and error diffusion dithered pattern), and the optimization direction (i.e., top to bottom, bottom to top, left to right, and right to left). Our ultimate goal is to generate the best possible quality binary pattern after optimization and hopefully provides guidelines on optimization strategies. Our simulation results suggest that an exhaustive optimization is necessary in order to produce the best quality pattern.

Paper Details

Date Published: 13 November 2014
PDF: 7 pages
Proc. SPIE 9276, Optical Metrology and Inspection for Industrial Applications III, 92760C (13 November 2014); doi: 10.1117/12.2070799
Show Author Affiliations
Junfei Dai, Zhejiang Univ. (China)
Song Zhang, Iowa State Univ. (United States)

Published in SPIE Proceedings Vol. 9276:
Optical Metrology and Inspection for Industrial Applications III
Sen Han; Toru Yoshizawa; Song Zhang, Editor(s)

© SPIE. Terms of Use
Back to Top