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Proceedings Paper

Multiple spectrum analysis and evaluation for optical constants of HfO2 thin films
Author(s): Dandan Liu; Huasong Liu; Chenghui Jiang; Yugang Jiang; Lishuan Wang; Zhihong Zhao; Yiqin Ji
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Paper Abstract

HfO2 thin films were deposited on ZS1 silica by Ion Beam Sputtering (IBS) technique. Optical constants of HfO2 thin films were obtained by multiple spectrum analysis method, which combined the transmittance spectrum and ellipsometry spectrum of the film. The refractive index and extinction coiefficient of HfO2 thin films were evaluated by etching experiments of the film. The analysis spectral range was between 250nm and 850nm.

Paper Details

Date Published: 21 August 2014
PDF: 6 pages
Proc. SPIE 9283, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 92830G (21 August 2014); doi: 10.1117/12.2070046
Show Author Affiliations
Dandan Liu, Tianjin Jinhang Institute of Technical Physics (China)
Huasong Liu, Tianjin Jinhang Institute of Technical Physics (China)
Chenghui Jiang, Tianjin Jinhang Institute of Technical Physics (China)
Yugang Jiang, Tianjin Jinhang Institute of Technical Physics (China)
Lishuan Wang, Tianjin Jinhang Institute of Technical Physics (China)
Harbin Institute of Technology (China)
Zhihong Zhao, Tianjin Jinhang Institute of Technical Physics (China)
Yiqin Ji, Tianjin Jinhang Institute of Technical Physics (China)


Published in SPIE Proceedings Vol. 9283:
7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Tianchun Ye; A. G. Poleshchuk; Song Hu, Editor(s)

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