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Proceedings Paper

Evaluation of AIMS D2DB simulation without calibration images
Author(s): Masaharu Nishiguchi; Kouichi Kanno; Katsuya Hayano; Hideyoshi Takamizawa; Kana Ohara; Donghwan Son; Vikram Tolani
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Paper Abstract

AIMS is mainly used in photomask industry for verifying the impact of mask defects on wafer CD in DUV lithography process. AIMS verification is used for D2D configuration, where two AIMS images, reference and defect, are captured and compared. Criticality of defects is identified using a number of criteria. As photomasks with aggressive OPC and sub-resolution assist features (SRAFs) are manufactured in production environment, it is required to save time for identifying reference pattern and capturing the AIMS image from the mask. If it is a single die mask, such technology is truly not applicable. A solution is to use AIMS die-to-database (D2DB) methodology which compares AIMS defect image with simulated reference image from mask design data. In general, simulation needs calibration with AIMS images. Because there is the difference between an AIMS image except a defect and a reference image, the difference must be compensated. When it is successfully compensated, AIMS D2DB doesn’t need any reference images, but requires some AIMS images for calibration. Our approach to AIMS D2DB without calibration image is systematic comparison of several AIMS images and to fix optical condition parameters for reducing calibration time. And we tried to calibrate using defect AIMS image to this approach. In this paper, we discuss performance of AIMS D2DB simulation without calibration images.

Paper Details

Date Published: 28 July 2014
PDF: 9 pages
Proc. SPIE 9256, Photomask and Next-Generation Lithography Mask Technology XXI, 925605 (28 July 2014); doi: 10.1117/12.2070026
Show Author Affiliations
Masaharu Nishiguchi, Dai Nippon Printing Co., Ltd. (Japan)
Kouichi Kanno, Dai Nippon Printing Co., Ltd. (Japan)
Katsuya Hayano, Dai Nippon Printing Co., Ltd. (Japan)
Hideyoshi Takamizawa, Dai Nippon Printing Co., Ltd. (Japan)
Kana Ohara, Luminescent Technologies, Inc. (United States)
Donghwan Son, Luminescent Technologies, Inc. (United States)
Vikram Tolani, Luminescent Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 9256:
Photomask and Next-Generation Lithography Mask Technology XXI
Kokoro Kato, Editor(s)

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