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Proceedings Paper

Model and calibrating of a 5-DOF objective
Author(s): Yiguang Cheng; Lei Chen; Lixin Zhao; Song Hu; Junmin Tong
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Paper Abstract

Now it’s more and more higher for the image quality of lithography systems .Due to the errors in the processing and assembly , the image quality of the traditional lens becomes lower and deviates from the theoretical value of the design. To improve image quality, it’s necessary to adjust some lens. The new objective lens having the adjustment mechanism and the measuring means were designed. A closed loop was designed to achieve the x, y, z, θx , θy of lens. Since the assembly errors existed, the theoretical relationship between the executive mechanism, measuring means and lens position needed to be calibrated. Ultimately we achieved about 150nm regulation accuracy of the x, y direction , 300nm regulation accuracy of z direction ,and 0.15'' regulation accuracy of the θx, θy direction .

Paper Details

Date Published: 18 September 2014
PDF: 8 pages
Proc. SPIE 9282, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 92821Y (18 September 2014); doi: 10.1117/12.2069770
Show Author Affiliations
Yiguang Cheng, Institute of Optics and Electronics (China)
Lei Chen, Institute of Optics and Electronics (China)
Lixin Zhao, Institute of Optics and Electronics (China)
Song Hu, Institute of Optics and Electronics (China)
Junmin Tong, Xuchang Vocational and Technical College (China)


Published in SPIE Proceedings Vol. 9282:
7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; Wei Gao, Editor(s)

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