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Proceedings Paper

Model-based virtual VSB mask writer verification for efficient mask error checking and optimization prior to MDP
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Paper Abstract

A methodology is described wherein a calibrated model-based ‘Virtual’ Variable Shaped Beam (VSB) mask writer process simulator is used to accurately verify complex Optical Proximity Correction (OPC) and Inverse Lithography Technology (ILT) mask designs prior to Mask Data Preparation (MDP) and mask fabrication. This type of verification addresses physical effects which occur in mask writing that may impact lithographic printing fidelity and variability. The work described here is motivated by requirements for extreme accuracy and control of variations for today’s most demanding IC products. These extreme demands necessitate careful and detailed analysis of all potential sources of uncompensated error or variation and extreme control of these at each stage of the integrated OPC/ MDP/ Mask/ silicon lithography flow. The important potential sources of variation we focus on here originate on the basis of VSB mask writer physics and other errors inherent in the mask writing process. The deposited electron beam dose distribution may be examined in a manner similar to optical lithography aerial image analysis and image edge log-slope analysis. This approach enables one to catch, grade, and mitigate problems early and thus reduce the likelihood for costly long-loop iterations between OPC, MDP, and wafer fabrication flows. It moreover describes how to detect regions of a layout or mask where hotspots may occur or where the robustness to intrinsic variations may be improved by modification to the OPC, choice of mask technology, or by judicious design of VSB shots and dose assignment.

Paper Details

Date Published: 8 October 2014
PDF: 12 pages
Proc. SPIE 9235, Photomask Technology 2014, 923509 (8 October 2014); doi: 10.1117/12.2069613
Show Author Affiliations
Robert C. Pack, GLOBALFOUNDRIES Inc. (United States)
Keith Standiford, GLOBALFOUNDRIES Inc. (United States)
Todd Lukanc, GLOBALFOUNDRIES Inc. (United States)
Guo Xiang Ning, GLOBALFOUNDRIES Inc. (United States)
Piyush Verma, GLOBALFOUNDRIES Inc. (United States)
Fadi Batarseh, GLOBALFOUNDRIES Inc. (United States)
Gek Soon Chua, GLOBALFOUNDRIES Singapore (Singapore)
Akira Fujimura, D2S, Inc. (United States)
Linyong Pang, D2S, Inc. (United States)


Published in SPIE Proceedings Vol. 9235:
Photomask Technology 2014
Paul W. Ackmann; Naoya Hayashi, Editor(s)

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