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Proceedings Paper

Photonic curvilinear data processing
Author(s): Clyde Browning; Thomas Quaglio; Thiago Figueiro; Sébastien Pauliac; Jérôme Belledent; Aurélien Fay; Jessy Bustos; Jean-Christophe Marusic; Patrick Schiavone
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Paper Abstract

With more and more photonic data presence in e-beam lithography, the need for efficient and accurate data fracturing is required to meet acceptable manufacturing cycle time. Large photonic based layouts now create high shot count patterns for VSB based tools. Multiple angles, sweeping curves, and non-orthogonal data create a challenge for today’s e-beam tools that are more efficient on Manhattan style data. This paper describes techniques developed and used for creating fractured data for VSB based pattern generators. Proximity Effect Correction is also applied during the fracture process, taking into account variable shot sizes to apply for accuracy and design style. Choosing different fracture routines for pattern data on-the-fly allows for fast and efficient processing. Data interpretation is essential for processing curvilinear data as to its size, angle, and complexity. Fracturing complex angled data into "efficient" shot counts is no longer practical as shot creation now requires knowledge of the actual data content as seen in photonic based pattern data. Simulation and physical printing results prove the implementations for accuracy and write times compared to traditional VSB writing strategies on photonic data. Geometry tolerance is used as part of the fracturing algorithm for controlling edge placement accuracy and tuning to different e-beam processing parameters.

Paper Details

Date Published: 29 October 2014
PDF: 10 pages
Proc. SPIE 9235, Photomask Technology 2014, 92350V (29 October 2014); doi: 10.1117/12.2069335
Show Author Affiliations
Clyde Browning, Aselta Nanographics (France)
Thomas Quaglio, Aselta Nanographics (France)
Thiago Figueiro, Aselta Nanographics (France)
Sébastien Pauliac, CEA-LETI (France)
Jérôme Belledent, CEA-LETI (France)
Aurélien Fay, CEA-LETI (France)
Jessy Bustos, STMicroelectronics (France)
Jean-Christophe Marusic, Soitec (France)
Patrick Schiavone, Aselta Nanographics (France)


Published in SPIE Proceedings Vol. 9235:
Photomask Technology 2014
Paul W. Ackmann; Naoya Hayashi, Editor(s)

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