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Proceedings Paper

A study of the non-uniform current density influence in reactive sputtering deposition
Author(s): Tao Wang; He Yu; Chao Chen; Yang Wang; Yadong Jiang
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Paper Abstract

In this work, a modeling for reactive sputtering has been presented where the non-uniform current density is taken into account. The model in this paper can be used to understand the process of reactive magnetron sputtering. The results are compared with those that assume uniform discharge current density distributed on the target. It can be concluded that the process with the non-uniform discharge density shows a higher flow of gas reactive when occurring the hysteresis behavior. In addition, a study of the radial variation of the target composition in metallic and compound mode is also performed.

Paper Details

Date Published: 2 September 2014
PDF: 6 pages
Proc. SPIE 9284, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronics Materials and Devices for Sensing and Imaging, 92841A (2 September 2014); doi: 10.1117/12.2069207
Show Author Affiliations
Tao Wang, Univ. of Electronic Science and Technology of China (China)
He Yu, Univ. of Electronic Science and Technology of China (China)
Chao Chen, Univ. of Electronic Science and Technology of China (China)
Yang Wang, Univ. of Electronic Science and Technology of China (China)
Yadong Jiang, Univ. of Electronic Science and Technology of China (China)


Published in SPIE Proceedings Vol. 9284:
7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optoelectronics Materials and Devices for Sensing and Imaging
Yadong Jiang; Junsheng Yu; Bernard Kippelen, Editor(s)

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