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Proceedings Paper

MOCVD optimized growth for laser diodes emitting at 980nm via photoluminescence
Author(s): Jianjun Li; Linjie He; Shengjie Lin; Jun Han; Jun Deng
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Paper Abstract

We have investigated different growth conditions of AlGaAs and InGaAs quantum wells (QWs) by metal organic chemical vapor deposition (MOCVD) for applications in high-power laser diodes emitting at 980nm. According to different experimental results measured by Photoluminescence (PL), we optimized the growth conditions. Growth temperature, V/III ratio, growth interruption and spacer time have been studied in detail. We have found the optimal growth conditions for laser diodes emitting at 980nm grown by metal organic chemical vapor deposition (MOCVD). As for our experiments, the best suitable growth temperature of AlGaAs and InGaAs QWs was 700°C and 600°C, respectively. The growth procedure of laser diodes should include growth interruption and spacer layers surrounding QWs. V/III ratio was about 130 during the growth of QWs.

Paper Details

Date Published: 21 August 2014
PDF: 6 pages
Proc. SPIE 9233, International Symposium on Photonics and Optoelectronics 2014, 92330J (21 August 2014); doi: 10.1117/12.2069135
Show Author Affiliations
Jianjun Li, Beijing Univ. of Technology (China)
Linjie He, Beijing Univ. of Technology (China)
Shengjie Lin, Beijing Univ. of Technology (China)
Jun Han, Beijing Univ. of Technology (China)
Jun Deng, Beijing Univ. of Technology (China)


Published in SPIE Proceedings Vol. 9233:
International Symposium on Photonics and Optoelectronics 2014
Zhiping Zhou, Editor(s)

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