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Proceedings Paper

Metalorganic chemical vapor deposition (MOCVD) and atomic force microscopy (AFM) study of high-quality Bi-2223 superconducting thin films
Author(s): Kazuhiro Endo
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Paper Abstract

Bi-Sr-Ca-Cu-O superconducting films consisting of 2223-high Tc single phase have been prepared on LaAlO3(100) and Nd:YAlO3(001) substrates without post-annealing by MOCVD. As-deposited films exhibited the highest Tc(zero) of 97 K and the highest Jc of 3.8 X 105 Acm-2 at 77 K under zero magnetic field as reported so far. It also showed little degradation of Jc under high magnetic field up to 8 T at 77 K. It was speculated through the measurement of the angular dependence of Jc that the origin of such high Jc is primarily attributed to the intrinsic pinning mechanism. AFM observations of these film surfaces have been carried out to elucidate the crystal growth mechanism and the effect of surface structures on superconducting properties. AFM images of the film surfaces grown on LaAlO3(100) (off angles <EQ 0.3 deg.) and on Nd:YAlO3(001) (off angle approximately 2.7 deg.) clearly showed a 2D nucleation growth and a step flow growth mechanism, respectively. The magnetic-field dependence of Jc and the observed surface morphologies strongly suggest that these as-grown films have no weak-links, which is a promising characteristic for device applications.

Paper Details

Date Published: 24 April 1995
PDF: 9 pages
Proc. SPIE 2397, Optoelectronic Integrated Circuit Materials, Physics, and Devices, (24 April 1995); doi: 10.1117/12.206902
Show Author Affiliations
Kazuhiro Endo, Electrotechnical Lab. (Japan)


Published in SPIE Proceedings Vol. 2397:
Optoelectronic Integrated Circuit Materials, Physics, and Devices
Manijeh Razeghi; Yoon-Soo Park; Gerald L. Witt, Editor(s)

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