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Proceedings Paper

Impact of the basal material on the deposition titanium nitride thin films
Author(s): Shuying Fu; Hongliang Li
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Paper Abstract

Studied by dc reactive magnetron sputtering method, with Si - p and Si (111) - p (100), two different Si do base, affect the performance of TiNx thin film preparation. Results show that Si - of the preparation of p (111) as the basal TiNx film performance is better than that of Si - p (100), the performance in the particles more renew, more Octavia and XRD diffraction fengfeng shape with TiNx diffraction peak do not overlap. Therefore, choose p - Si (111) basal deposited titanium nitride thin films, can meet the requirements of the preparation of optical thin film quality.

Paper Details

Date Published: 21 August 2014
PDF: 5 pages
Proc. SPIE 9285, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Smart Structures and Materials for Manufacturing and Testing, 928507 (21 August 2014); doi: 10.1117/12.2069017
Show Author Affiliations
Shuying Fu, Hanshan Normal Univ. (China)
Hongliang Li, Hanshan Normal Univ. (China)


Published in SPIE Proceedings Vol. 9285:
7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Smart Structures and Materials for Manufacturing and Testing
Xiangang Luo; Harald Giessen, Editor(s)

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