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Proceedings Paper

Ultra-precision process of CaF2 single crystal
Author(s): Guoju Yin; Shengyi Li; Xuhui Xie; Lin Zhou
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Paper Abstract

This paper proposes a new chemical mechanical polishing (CMP) process method for CaF2 single crystal to get ultraprecision surface. The CMP processes are improving polishing pad and using alkaline SiO2 polishing slurry with PH=8, PH=11 two phases to polish, respectively, and the roughness can be 0.181nm Rq (10μm×10μm). The CMP process can’t get high surface figure, so we use ion beam figuring (IBF) technology to obtain high surface figure. However, IBF is difficult to improve the CaF2 surface roughness. We optimize IBF process to improve surface figure and keep good surface roughness too. Different IBF incident ion energy from 400ev to 800ev does not affect on the surface roughness obviously but the depth of material removal is reverse. CaF2 single crystal can get high precision surface figure (RMS=2.251nm) and still keep ultra-smooth surface (Rq=0.207nm) by IBF when removal depth is less than 200nm. The researches above provide important information for CaF2 single crystal to realize ultra-precision manufacture.

Paper Details

Date Published: 6 August 2014
PDF: 6 pages
Proc. SPIE 9281, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 92811I (6 August 2014); doi: 10.1117/12.2069015
Show Author Affiliations
Guoju Yin, National Univ. of Defense Technology (China)
Hu’nan Key Lab. of Ultra-precision Machining Technology (China)
Shengyi Li, National Univ. of Defense Technology (China)
Hu’nan Key Lab. of Ultra-precision Machining Technology (China)
Xuhui Xie, National Univ. of Defense Technology (China)
Hu’nan Key Lab. of Ultra-precision Machining Technology (China)
Lin Zhou, National Univ. of Defense Technology (China)
Hu’nan Key Lab. of Ultra-precision Machining Technology (China)


Published in SPIE Proceedings Vol. 9281:
7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies
Li Yang; Eric Ruch; Shengyi Li, Editor(s)

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