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Proceedings Paper

Nonlinear optical properties of metal-nitride thin films
Author(s): Paul M. Lundquist; Weiping Lin; John B. Ketterson; George K. Wong; Long D. Zhu; Peter E. Norris
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Paper Abstract

Robust second-order optical nonlinearities comparable to those in common nonlinear optical materials have been reported in metal nitrides. In this paper we present experimental studies of gallium nitride and aluminum nitride thin films, including fabrication and optical characterization. The ease of thin film deposition techniques employed for these materials indicate that they may have potential for cost effective development of nonlinear optical waveguide devices.

Paper Details

Date Published: 24 April 1995
PDF: 7 pages
Proc. SPIE 2397, Optoelectronic Integrated Circuit Materials, Physics, and Devices, (24 April 1995); doi: 10.1117/12.206880
Show Author Affiliations
Paul M. Lundquist, Northwestern Univ. (United States)
Weiping Lin, Northwestern Univ. (United States)
John B. Ketterson, Northwestern Univ. (United States)
George K. Wong, Northwestern Univ. (United States)
Long D. Zhu, NZ Applied Technologies (United States)
Peter E. Norris, NZ Applied Technologies (United States)


Published in SPIE Proceedings Vol. 2397:
Optoelectronic Integrated Circuit Materials, Physics, and Devices
Manijeh Razeghi; Yoon-Soo Park; Gerald L. Witt, Editor(s)

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