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Proceedings Paper

Intelligent control system based on ARM for lithography tool
Author(s): Changlong Chen; Xiaoping Tang; Song Hu; Nan Wang
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Paper Abstract

The control system of traditional lithography tool is based on PC and MCU. The PC handles the complex algorithm, human-computer interaction, and communicates with MCU via serial port; The MCU controls motors and electromagnetic valves, etc. This mode has shortcomings like big volume, high power consumption, and wasting of PC resource. In this paper, an embedded intelligent control system of lithography tool, based on ARM, is provided. The control system used S5PV210 as processor, completing the functions of PC in traditional lithography tool, and provided a good human-computer interaction by using LCD and capacitive touch screen. Using Android4.0.3 as operating system, the equipment provided a cool and easy UI which made the control more user-friendly, and implemented remote control and debug, pushing video information of product by network programming. As a result, it’s convenient for equipment vendor to provide technical support for users. Finally, compared with traditional lithography tool, this design reduced the PC part, making the hardware resources efficiently used and reducing the cost and volume. Introducing embedded OS and the concepts in “The Internet of things” into the design of lithography tool can be a development trend.

Paper Details

Date Published: 21 August 2014
PDF: 6 pages
Proc. SPIE 9283, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems, 92830K (21 August 2014); doi: 10.1117/12.2068565
Show Author Affiliations
Changlong Chen, Institute of Optics and Electronics (China)
Univ. of Chinese Academy of Sciences (China)
Xiaoping Tang, Institute of Optics and Electronics (China)
Song Hu, Institute of Optics and Electronics (China)
Nan Wang, Institute of Optics and Electronics (China)
Univ. of Chinese Academy of Sciences (China)


Published in SPIE Proceedings Vol. 9283:
7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
Tianchun Ye; A. G. Poleshchuk; Song Hu, Editor(s)

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