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Proceedings Paper

AIMS EUV first light imaging performance
Author(s): Anthony Garetto; Renzo Capelli; Krister Magnusson; Jan Hendrik Peters; Sascha Perlitz; Ulrich Matejka; Dirk Hellweg; Markus Weiss; Michael Goldstein
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Paper Abstract

Overcoming the challenges associated with photomask defectivity is one of the key aspects associated with EUV mask infrastructure. In addition to establishing specific EUV mask repair approaches, the ability to identify printable mask defects that require repair as well as to verify if a repair was successful are absolutely necessary. Such verification can only be performed by studying the repaired region using actinic light at an exact emulation of the scanner illumination conditions of the mask as can be done by the AIMSTM EUV. ZEISS, in collaboration with the SEMATECH EUVL Mask Infrastructure (EMI) consortium are currently developing the AIMSTM EUV system and have recently achieved First Light on the prototype system, a major achievement. First light results will be presented in addition to the current development status of the system.

Paper Details

Date Published: 29 October 2014
PDF: 8 pages
Proc. SPIE 9235, Photomask Technology 2014, 92350N (29 October 2014); doi: 10.1117/12.2068308
Show Author Affiliations
Anthony Garetto, Carl Zeiss SMS GmbH (Germany)
Renzo Capelli, Carl Zeiss SMS GmbH (Germany)
Krister Magnusson, Carl Zeiss SMS GmbH (Germany)
Jan Hendrik Peters, Carl Zeiss SMS GmbH (Germany)
Sascha Perlitz, Carl Zeiss SMS GmbH (Germany)
Ulrich Matejka, Carl Zeiss SMS GmbH (Germany)
Dirk Hellweg, Carl Zeiss SMT GmbH (Germany)
Markus Weiss, Carl Zeiss SMT GmbH (Germany)
Michael Goldstein, SEMATECH Inc. (United States)

Published in SPIE Proceedings Vol. 9235:
Photomask Technology 2014
Paul W. Ackmann; Naoya Hayashi, Editor(s)

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