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Proceedings Paper

Effect of illumination parameters on the quality of wavefront diffracted by pinhole
Author(s): Gongming Ding; Yuejing Qi; Zengxiong Lu; Guangyi Liu
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Paper Abstract

High quality spherical wave, which is typically generated by the pinhole diffraction, is the core for calibration of the high-accuracy wavefront testing. The quality of the spherical wave diffracted by the pinhole is mainly determined by pinhole’s thickness, diameter, shape, material and illumination parameters. In this paper, we analyze the effect of illumination parameters such as the aberrations and numerical aperture (NA) on the quality of the spherical wave diffracted by the pinhole based on finite difference time domain (FDTD) method. The results show that the wavefront error of the spherical wave is about 8.4E-4 λ RMS when the NA of the illumination light is 0.75 and the diameter of the pinhole is 200 nm. Wavefront error of the diffracted spherical wave increases as the NA of the aberrant illumination beam increasing. Compare with astigmatism, defocus and spherical aberration, coma has the largest effect on the wavefront quality and is the most difficult aberration to filter. The conclusion supports important reference for determining the illumination parameters in calibration of high accuracy wavefront testing system.

Paper Details

Date Published: 18 September 2014
PDF: 7 pages
Proc. SPIE 9282, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 92821U (18 September 2014); doi: 10.1117/12.2068292
Show Author Affiliations
Gongming Ding, Hefei Univ. of Technology (China)
Academy of Opto-Electronics (China)
Yuejing Qi, Academy of Opto-Electronics (China)
Zengxiong Lu, Academy of Opto-Electronics (China)
Guangyi Liu, Academy of Opto-Electronics (China)


Published in SPIE Proceedings Vol. 9282:
7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; Wei Gao, Editor(s)

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