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Proceedings Paper

Photothermal microscopic studies of surface and subsurface defects on fused silica at 355nm
Author(s): Jian Chen; Jingtao Dong; Qi Zhang; Zhouling Wu
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Paper Abstract

It is believed that surface and subsurface defects formed during standard grinding and polishing processes are mainly responsible for laser induced damage in fused silica. The correlation between the laser damage susceptibility and absorption property of these defects has not been totally understood. In this paper, we present the characterization of surface and subsurface defects of fused silica by measuring their absorption properties based on a photothermal technique at 355 nm. The photothermal microscopic imaging reveals that the surface/subsurface absorption defects in fused silica can be identified. In addition, a 3D photothermal imaging of a laser damage site on the silica is also obtained. Our results demonstrate that photothermal microscopy is a powerful tool for defect characterization of optical materials for high power laser applications.

Paper Details

Date Published: 31 October 2014
PDF: 7 pages
Proc. SPIE 9237, Laser-Induced Damage in Optical Materials: 2014, 923706 (31 October 2014); doi: 10.1117/12.2068119
Show Author Affiliations
Jian Chen, ZC Optoelectronic Technologies, Ltd. (China)
Jingtao Dong, ZC Optoelectronic Technologies, Ltd. (China)
Qi Zhang, ZC Optoelectronic Technologies, Ltd. (China)
Zhouling Wu, ZC Optoelectronic Technologies, Ltd. (China)


Published in SPIE Proceedings Vol. 9237:
Laser-Induced Damage in Optical Materials: 2014
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; MJ Soileau; Detlev Ristau, Editor(s)

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