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Proceedings Paper

Influence of organic contamination on laser induced damage of multilayer dielectric mirrors by subpicosecond laser pulses
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Paper Abstract

Laser induced damage of optical components is often a limiting factor for the development of high power lasers. Indeed, for many years, organic contamination is identified as a factor decreasing the laser induced damage threshold of optical surfaces, limiting the use of high fluencies. Also, for the development of its laser facilities, Laser MégaJoule and PETawatt Aquitaine Laser, the Commissariat à l’Energie Atomique et aux Energies Alternatives investigates the influence of organic contamination on the performances of the optical components. Actually, although great care is provided on the cleanliness of the optics, organic volatile compounds outgassed from surrounding materials can be adsorbed by the sensitive surfaces during its timelife. Thus, for this study, performances of clean and contaminated multilayer dielectric mirrors are compared. Contamination is intentionally realized either by controlled protocols or by exposing optics inside the laser facilities. Qualification and quantification of the organic contamination is realized by automated thermal desorption and gas chromatography coupled with mass spectrometry. Laser induced damage threshold of clean and contaminated mirrors are then investigated by 1053 nm laser at 670 fs.

Paper Details

Date Published: 31 October 2014
PDF: 6 pages
Proc. SPIE 9237, Laser-Induced Damage in Optical Materials: 2014, 923707 (31 October 2014); doi: 10.1117/12.2067902
Show Author Affiliations
O. Favrat, Commissariat à l'Énergie Atomique (France)
M. Sozet, Commissariat à l'Énergie Atomique (France)
I. Tovena-Pécault, Commissariat à l'Énergie Atomique (France)
L. Lamaignère, Commissariat à l'Énergie Atomique (France)
J. Néauport, Commissariat à l'Énergie Atomique (France)


Published in SPIE Proceedings Vol. 9237:
Laser-Induced Damage in Optical Materials: 2014
Gregory J. Exarhos; Vitaly E. Gruzdev; Joseph A. Menapace; Detlev Ristau; MJ Soileau; Detlev Ristau, Editor(s)

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