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Proceedings Paper

Research of thin film damage testing based on photothermal deflection
Author(s): Jintao Han; Lihong Yang; Junhong Su; Tao Wang
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Paper Abstract

Optical thin film is the weak link in the entire laser systems; its resistant ability of laser induced damage is the bottleneck of laser systems which improve towards high-energy and high-power direction meanwhile. Owing to these, measurement of LIDT has been paid more and more attention to. The laser damage model of film was established. Based on this principle, criterion of photothermal deflection damage was determined. Experimental device based on laser damage model was set up. After experiments of SiO2 films were conducted, beam offset under different energy was obtained. Comparative analysis of results between image processing method and photothermal deflection method were shown in the article. Experimental results show that photothermal deflection method is more sensitive than image method on measurement of film laser damage.

Paper Details

Date Published: 18 September 2014
PDF: 6 pages
Proc. SPIE 9282, 7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment, 928222 (18 September 2014); doi: 10.1117/12.2067891
Show Author Affiliations
Jintao Han, Xi'an Technological Univ. (China)
Lihong Yang, Xi'an Technological Univ. (China)
Junhong Su, Xi'an Technological Univ. (China)
Tao Wang, Xi'an Technological Univ. (China)


Published in SPIE Proceedings Vol. 9282:
7th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment
Yudong Zhang; Wei Gao, Editor(s)

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