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Proceedings Paper

Omnidirectional wavelength selective emitters/absorbers based on dielectric-filled anti-reflection coated two-dimensional metallic photonic crystals
Author(s): Yi Xiang Yeng; Jeffrey B. Chou; Veronika Rinnerbauer; Yichen Shen; Sang-Gook Kim; John D. Joannopoulos; Marin Soljačić; Ivan Čelanović
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Paper Abstract

We demonstrate designs of dielectric-filled anti-reflection coated (ARC) two-dimensional (2D) metallic photonic crystals (MPhCs) capable of omnidirectional, polarization insensitive, wavelength selective emission/absorption. Up to 26% improvement in hemispherically averaged emittance/absorptance below the cutoff wavelength is observed for optimized hafnium oxide filled 2D tantalum (Ta) PhCs over the unfilled 2D Ta PhCs. The optimized designs possess high hemispherically averaged emittance/absorptance of 0.86 at wavelengths below the cutoff wavelength and low hemispherically averaged emittance/absorptance of 0.12 at wavelengths above the cutoff wavelength, which is extremely promising for applications such as thermophotovoltaic energy conversion, solar absorption, and infrared spectroscopy.

Paper Details

Date Published: 28 August 2014
PDF: 8 pages
Proc. SPIE 9170, Nanoengineering: Fabrication, Properties, Optics, and Devices XI, 91700X (28 August 2014); doi: 10.1117/12.2067796
Show Author Affiliations
Yi Xiang Yeng, Massachusetts Institute of Technology (United States)
Jeffrey B. Chou, Massachusetts Institute of Technology (United States)
Veronika Rinnerbauer, Johannes Kepler Univ. Linz (Austria)
Yichen Shen, Massachusetts Institute of Technology (United States)
Sang-Gook Kim, Massachusetts Institute of Technology (United States)
John D. Joannopoulos, Massachusetts Institute of Technology (United States)
Marin Soljačić, Massachusetts Institute of Technology (United States)
Ivan Čelanović, Massachusetts Institute of Technology (United States)


Published in SPIE Proceedings Vol. 9170:
Nanoengineering: Fabrication, Properties, Optics, and Devices XI
Eva M. Campo; Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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