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Proceedings Paper

Study of hotspot repair using cellular automata method
Author(s): Norimasa Nagase; Kanji Takeuchi; Mitsuo Sakurai; Takahisa Itoh; Tomoyuki Okada
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Paper Abstract

In advanced semiconductor manufacturing, model-based optical proximity correction is commonly used to compensate for image errors. The final pattern is generated using correction values determined by lithography simulation. Image errors such as patterns with insufficient correction or patterns with excessive correction can be generated. These patterns with errors are called hotspots. Such errors are conventionally detected by lithography simulation of OPC patterns. When a hotspot is detected by lithography simulation, it has to be repaired manually or by repeated use of OPC tool. However, it is difficult to obtain correct pattern for a complicated shape, and the correction procedure may require a significant amount of additional processing. In order to solve this issue, we examine application of cellular automata (CA) method for hotspot correction. It is known that CA method can be used for weather or traffic analysis and prediction. In this report, we studied the CA method for deriving simple hotspot repair rule based on lattice cell-like models for light intensity distribution and OPC patterns. We will report on the results of hotspot correction technique with the OPC pattern using CA method.

Paper Details

Date Published: 28 July 2014
PDF: 8 pages
Proc. SPIE 9256, Photomask and Next-Generation Lithography Mask Technology XXI, 92560V (28 July 2014); doi: 10.1117/12.2067112
Show Author Affiliations
Norimasa Nagase, Fujitsu Semiconductor Ltd. (Japan)
Kanji Takeuchi, Fujitsu Semiconductor Ltd. (Japan)
Mitsuo Sakurai, Fujitsu Semiconductor Ltd. (Japan)
Takahisa Itoh, Fujitsu Semiconductor Ltd. (Japan)
Tomoyuki Okada, Fujitsu Semiconductor Ltd. (Japan)


Published in SPIE Proceedings Vol. 9256:
Photomask and Next-Generation Lithography Mask Technology XXI
Kokoro Kato, Editor(s)

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