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Proceedings Paper

Contact hole multiplication using grapho-epitaxy directed self-assembly: process choices, template optimization, and placement accuracy
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Paper Abstract

Directed Self Assembly (DSA) of Block Co-Polymers (BCP) has become an intense field of study as a potential patterning solution for future generation devices. The most critical challenges that need to be understood and controlled include pattern placement accuracy, achieving low defectivity in DSA patterns and how to implement this process as a patterning solution. The DSA program at imec includes efforts on these three major topics. Specifically, in this paper the progress for the templated DSA flow within the imec program will be discussed. An experimental assessment is made based on a 37 nm BCP pitch material. In particular, the impact of different process options is illustrated, and data for CD and placement accuracy of the DSA holes in their template is provided.

Paper Details

Date Published: 17 October 2014
PDF: 11 pages
Proc. SPIE 9231, 30th European Mask and Lithography Conference, 92310R (17 October 2014); doi: 10.1117/12.2066647
Show Author Affiliations
Joost Bekaert, IMEC (Belgium)
Jan Doise, IMEC (Belgium)
Vijaya-Kumar Murugesan Kuppuswamy, IMEC (Belgium)
Katholieke Univ. Leuven (Belgium)
Roel Gronheid, IMEC (Belgium)
Boon Teik Chan, IMEC (Belgium)
Geert Vandenberghe, IMEC (Belgium)
Yi Cao, AZ Electronic Materials (United States)
YoungJun Her, AZ Electronic Materials (United States)

Published in SPIE Proceedings Vol. 9231:
30th European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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