Share Email Print
cover

Proceedings Paper

A compact physical CD-SEM simulator for IC photolithography modeling applications
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Scanning Electron Microscopy (SEM) is widely used to measure Critical Dimensions (CD) in semiconductor lithography processes. As the size of transistors keeps shrinking, the uncertainty associated with CD-SEM accounts for a fast growing contributor to the entire manufacturing error budget. Capability to predict the metrology results from a CDSEM is highly desirable to quantify the uncertainty of metrology. Simulation has proven to be a valuable means of studying both SEM metrology and photolithography. Monte-Carlo based simulators are generally used to model the detailed image formation process of a CD-SEM, while physics-based photolithography simulations, such as PROLITH™ are commonly used for lithography modeling. However, the high computational cost limits the application of Monte- Carlo based CD-SEM simulations in conjunction with lithography simulation. We present here a compact physical CDSEM simulator which simplifies the image formation process while preserving many essential SEM imaging mechanisms. Several applications of our CD-SEM simulator are presented to demonstrate the predicting capability compared with experiments.

Paper Details

Date Published: 16 September 2014
PDF: 11 pages
Proc. SPIE 9236, Scanning Microscopies 2014, 923618 (16 September 2014); doi: 10.1117/12.2066220
Show Author Affiliations
Chao Fang, KLA-Tencor Corp. (United States)
Mark D. Smith, KLA-Tencor Corp. (United States)
Alessandro Vaglio Pret, KLA-Tencor Corp. (United States)
John J. Biafore, KLA-Tencor Corp. (United States)
Stewart A. Robertson, KLA-Tencor Corp. (United States)
Joost Bekaert, imec (Belgium)


Published in SPIE Proceedings Vol. 9236:
Scanning Microscopies 2014
Michael T. Postek; Dale E. Newbury; S. Frank Platek; Tim K. Maugel, Editor(s)

© SPIE. Terms of Use
Back to Top