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Proceedings Paper

New grade of 9-inch size mask blanks for 450mm wafer process
Author(s): Noriyuki Harashima; Hiroyuki Iso; Tatsuya Chishima
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Paper Abstract

6-inch size (known as 6025QZ) binary Cr mask is widely used in the semiconductor lithography for over 20years. Recently for the 450mm wafer process, high grade 9-inch size mask is expected. For this application, we have studied and developed new grade 9-inch size mask blanks for recent 450mm wafer process requirement. There are three types of glass substrates material use and select as 9inch size mask blanks and for required applications by the users. Each glass material has advantage and disadvantage for lithography process as well as wafer process. By knowing the each glass substrate material characteristics and quality level the users enable to select the proper 9inch mask blanks for their targeting applications.

Paper Details

Date Published: 8 October 2014
PDF: 4 pages
Proc. SPIE 9235, Photomask Technology 2014, 92351M (8 October 2014); doi: 10.1117/12.2066075
Show Author Affiliations
Noriyuki Harashima, ULVAC Coating Corp. (Japan)
Hiroyuki Iso, ULVAC Coating Corp. (Japan)
Tatsuya Chishima, ULVAC Coating Corp. (Japan)


Published in SPIE Proceedings Vol. 9235:
Photomask Technology 2014
Paul W. Ackmann; Naoya Hayashi, Editor(s)

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