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Proceedings Paper

Automated hotspot analysis with aerial image CD metrology for advanced logic devices
Author(s): Ute Buttgereit; Thomas Trautzsch; Min-ho Kim; Jung-Uk Seo; Young-Keun Yoon; Hak-Seung Han; Dong Hoon Chung; Chan-Uk Jeon; Gary Meyers
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Paper Abstract

Continuously shrinking designs by further extension of 193nm technology lead to a much higher probability of hotspots especially for the manufacturing of advanced logic devices. The CD of these potential hotspots needs to be precisely controlled and measured on the mask. On top of that, the feature complexity increases due to high OPC load in the logic mask design which is an additional challenge for CD metrology. Therefore the hotspot measurements have been performed on WLCD from ZEISS, which provides the benefit of reduced complexity by measuring the CD in the aerial image and qualifying the printing relevant CD. This is especially of advantage for complex 2D feature measurements. Additionally, the data preparation for CD measurement becomes more critical due to the larger amount of CD measurements and the increasing feature diversity. For the data preparation this means to identify these hotspots and mark them automatically with the correct marker required to make the feature specific CD measurement successful. Currently available methods can address generic pattern but cannot deal with the pattern diversity of the hotspots. The paper will explore a method how to overcome those limitations and to enhance the time-to-result in the marking process dramatically. For the marking process the Synopsys WLCD Output Module was utilized, which is an interface between the CATS mask data prep software and the WLCD metrology tool. It translates the CATS marking directly into an executable WLCD measurement job including CD analysis. The paper will describe the utilized method and flow for the hotspot measurement. Additionally, the achieved results on hotspot measurements utilizing this method will be presented.

Paper Details

Date Published: 16 September 2014
PDF: 10 pages
Proc. SPIE 9235, Photomask Technology 2014, 92350B (16 September 2014); doi: 10.1117/12.2065937
Show Author Affiliations
Ute Buttgereit, Carl Zeiss SMS GmbH (Germany)
Thomas Trautzsch, Carl Zeiss SMS GmbH (Germany)
Min-ho Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jung-Uk Seo, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Young-Keun Yoon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hak-Seung Han, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Dong Hoon Chung, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Chan-Uk Jeon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Gary Meyers, Synopsys, Inc. (United States)

Published in SPIE Proceedings Vol. 9235:
Photomask Technology 2014
Paul W. Ackmann; Naoya Hayashi, Editor(s)

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