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Proceedings Paper

Writing time estimation of EB mask writer EBM-9000 for hp16nm/logic11nm node generation
Author(s): Takashi Kamikubo; Hidekazu Takekoshi; Munehiro Ogasawara; Hirokazu Yamada; Kiyoshi Hattori
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Paper Abstract

The scaling of semiconductor devices is slowing down because of the difficulty in establishing their functionality at the nano-size level and also because of the limitations in fabrications, mainly the delay of EUV lithography. While multigate devices (FinFET) are currently the main driver for scalability, other types of devices, such as 3D devices, are being realized to relax the scaling of the node. In lithography, double or multiple patterning using ArF immersion scanners is still a realistic solution offered for the hp16nm node fabrication. Other lithography candidates are those called NGL (Next Generation Lithography), such as DSA (Directed-Self-Assembling) or nanoimprint. In such situations, shot count for mask making by electron beam writers will not increase. Except for some layers, it is not increasing as previously predicted. On the other hand, there is another aspect that increases writing time. The exposure dose for mask writing is getting higher to meet tighter specifications of CD uniformity, in other words, reduce LER. To satisfy these requirements, a new electron beam mask writer, EBM-9000, has been developed for hp16nm/logic11nm generation. Electron optical system, which has the immersion lens system, was evolved from EBM-8000 to achieve higher current density of 800A/cm2. In this paper, recent shot count and dose trend are discussed. Also, writing time is estimated for the requirements in EBM-9000.

Paper Details

Date Published: 17 October 2014
PDF: 9 pages
Proc. SPIE 9231, 30th European Mask and Lithography Conference, 923107 (17 October 2014); doi: 10.1117/12.2065544
Show Author Affiliations
Takashi Kamikubo, NuFlare Technology, Inc. (Japan)
Hidekazu Takekoshi, NuFlare Technology, Inc. (Japan)
Munehiro Ogasawara, NuFlare Technology, Inc. (Japan)
Hirokazu Yamada, NuFlare Technology, Inc. (Japan)
Kiyoshi Hattori, NuFlare Technology, Inc. (Japan)


Published in SPIE Proceedings Vol. 9231:
30th European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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