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Proceedings Paper

A broader view on EUV-masks: adding complementary imaging modes to the SHARP microscope
Author(s): Markus P. Benk; Ryan H. Miyakawa; Weilun Chao; Yow-Gwo Wang; Antoine Wojdyla; David G. Johnson; Alexander P. Donoghue; Kenneth A. Goldberg
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Paper Abstract

The authors are expanding the capabilities of the SHARP microscope by implementing complementary imaging modes. SHARP (the SEMATECH High-NA Actinic Reticle review Project) is an actinic, synchrotron-based microscope dedicated to extreme ultraviolet (EUV) photomask research. SHARP’s programmable Fourier Synthesis Illuminator and its use of Fresnel zoneplate lenses as imaging optics provide a versatile framework, facilitating the implementation of diverse modes beyond conventional imaging. In addition to SHARP’s set of standard zoneplates, we have created more than 100 zoneplates for complementary imaging modes, all designed to extract additional information from photomasks, improve navigation and enhance defect detection. More than 50 new zoneplates are installed in the tool; the remaining lenses are currently in production. In this paper we discuss the design and fabrication of zoneplates for complementary imaging modes and present image data, obtained using Zernike Phase Contrast and different implementations of Differential Interference Contrast.

Paper Details

Date Published: 8 October 2014
PDF: 11 pages
Proc. SPIE 9235, Photomask Technology 2014, 92350K (8 October 2014); doi: 10.1117/12.2065513
Show Author Affiliations
Markus P. Benk, Lawrence Berkeley National Lab (United States)
Ryan H. Miyakawa, Lawrence Berkeley National Lab. (United States)
Weilun Chao, Lawrence Berkeley National Lab. (United States)
Yow-Gwo Wang, Univ. of California, Berkeley (United States)
Antoine Wojdyla, Lawrence Berkeley National Lab. (United States)
David G. Johnson, Lawrence Berkeley National Lab. (United States)
Alexander P. Donoghue, Lawrence Berkeley National Lab. (United States)
Kenneth A. Goldberg, Lawrence Berkeley National Lab. (United States)


Published in SPIE Proceedings Vol. 9235:
Photomask Technology 2014
Paul W. Ackmann; Naoya Hayashi, Editor(s)

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