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Proceedings Paper

EBM-9000: EB mask writer for product mask fabrication of 16nm half-pitch generation and beyond
Author(s): Hidekazu Takekoshi; Takahito Nakayama; Kenichi Saito; Hiroyoshi Ando; Hideo Inoue; Noriaki Nakayamada; Takashi Kamikubo; Rieko Nishimura; Yoshinori Kojima; Jun Yashima; Akihito Anpo; Seiichi Nakazawa; Tomohiro Iijima; Kenji Ohtoshi; Hirohito Anze; Victor Katsap; Steven Golladay; Rodney Kendall
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Paper Abstract

EBM-9000 equipped with new features such as new electron optics, high current density (800A/cm2) and high speed deflection control has been developed for the 11nm technology node(tn) (half pitch (hp) 16nm). Also in parallel of aggressive introduction of new technologies, EBM-9000 inherits the 50kV variable shaped electron beam / vector scan architecture, continuous stage motion and VSB-12 data format handling from the preceding EBM series to maintain high reliability accepted by many customers. This paper will report our technical challenges and results obtained through the development.

Paper Details

Date Published: 28 July 2014
PDF: 8 pages
Proc. SPIE 9256, Photomask and Next-Generation Lithography Mask Technology XXI, 925607 (28 July 2014); doi: 10.1117/12.2065230
Show Author Affiliations
Hidekazu Takekoshi, NuFlare Technology, Inc. (Japan)
Takahito Nakayama, NuFlare Technology, Inc. (Japan)
Kenichi Saito, NuFlare Technology, Inc. (Japan)
Hiroyoshi Ando, NuFlare Technology, Inc. (Japan)
Hideo Inoue, NuFlare Technology, Inc. (Japan)
Noriaki Nakayamada, NuFlare Technology, Inc. (Japan)
Takashi Kamikubo, NuFlare Technology, Inc. (Japan)
Rieko Nishimura, NuFlare Technology, Inc. (Japan)
Yoshinori Kojima, NuFlare Technology, Inc. (Japan)
Jun Yashima, NuFlare Technology, Inc. (Japan)
Akihito Anpo, NuFlare Technology, Inc. (Japan)
Seiichi Nakazawa, NuFlare Technology, Inc. (Japan)
Tomohiro Iijima, NuFlare Technology, Inc. (Japan)
Kenji Ohtoshi, NuFlare Technology, Inc. (Japan)
Hirohito Anze, NuFlare Technology, Inc. (Japan)
Victor Katsap, NuFlare Technology, Inc. (United States)
Steven Golladay, NuFlare Technology, Inc. (United States)
Rodney Kendall, NuFlare Technology, Inc. (United States)


Published in SPIE Proceedings Vol. 9256:
Photomask and Next-Generation Lithography Mask Technology XXI
Kokoro Kato, Editor(s)

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