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Proceedings Paper • Open Access

At-wavelength metrology of x-ray optics at Diamond Light Source
Author(s): Hongchang Wang; Sebastien Berujon; John Sutter; Simon G. Alcock; Kawal Sawhney

Paper Abstract

Modern, third-generation synchrotron radiation sources provide coherent and extremely bright beams of X-ray radiation. The successful exploitation of such beams depends to a significant extent on imperfections and misalignment of the optics employed on the beamlines. This issue becomes even more critical with the increasing use of active optics, and the desire to achieve diffraction-limited and coherence-preserving X-ray beams. In recent years, significant progress has been made to improve optic testing and optimization techniques, especially those using X-rays for so-called atwavelength metrology. These in-situ and at-wavelength metrology methods can be used not only to optimize the performance of X-ray optics, but also to correct and minimize the collective distortions of upstream beamline optics, including monochromators, and transmission windows. An overview of at-wavelength metrology techniques implemented at Diamond Light Source is presented, including grating interferometry and X-ray near-field speckle based techniques. Representative examples of the application of these techniques are also given, including in-situ and atwavelength calibration and optimization of: active, piezo bimorph mirrors; Kirkpatrick-Baez (KB) mirrors; and refractive optics such as compound refractive lenses.

Paper Details

Date Published: 5 September 2014
PDF: 8 pages
Proc. SPIE 9206, Advances in Metrology for X-Ray and EUV Optics V, 920608 (5 September 2014); doi: 10.1117/12.2062828
Show Author Affiliations
Hongchang Wang, Diamond Light Source Ltd. (United Kingdom)
Sebastien Berujon, Diamond Light Source Ltd. (United Kingdom)
John Sutter, Diamond Light Source Ltd. (United Kingdom)
Simon G. Alcock, Diamond Light Source Ltd. (United Kingdom)
Kawal Sawhney, Diamond Light Source Ltd. (United Kingdom)


Published in SPIE Proceedings Vol. 9206:
Advances in Metrology for X-Ray and EUV Optics V
Lahsen Assoufid; Haruhiko Ohashi; Anand Krishna Asundi, Editor(s)

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