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Proceedings Paper

Modeling of laser-induced plume expansion into ambient gas for thin film deposition
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Paper Abstract

The expansion of laser-induced plume into an ambient gas under typical thin film deposition conditions is investigated. A simplified theoretical model has been developed to understand the dynamics of plume-ambient gas interaction under the gas pressure of typically a few tens Pa. The model is based upon the generation of a high-temperature and high-pressure plasma cloud which is initially confined to a sphere of irradiated spot radius and is then suddenly allowed to expand into a gas. The expansion is governed by the Euler system of nonstationary equations. The model has been applied to investigate the dynamics of laser ablation of YBaCuO in oxygen. Numerical results show that the series of density jumps following one after another are formed in the plume. The origin of these pulsations is attributed to the repeated reflections of the secondary shock wave due to the effect of plume overexpansion. Using the calculated data, the time-of-flight signal has been simulated to compare the numerical results with available experimental data. Surprisingly good quantitative agreement has been achieved.

Paper Details

Date Published: 10 April 1995
PDF: 10 pages
Proc. SPIE 2403, Laser-Induced Thin Film Processing, (10 April 1995); doi: 10.1117/12.206265
Show Author Affiliations
Nadezhda M. Bulgakova, Institute of Thermophysics (Russia)
Alexander V. Bulgakov, Institute of Thermophysics (Russia)


Published in SPIE Proceedings Vol. 2403:
Laser-Induced Thin Film Processing
Jan J. Dubowski, Editor(s)

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