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Proceedings Paper

Low-energy repetitive plasma focus based neon soft x-ray lithography source
Author(s): S. M. P. Kalaiselvi; T. L. Tan; A. Talebitaher; P. Lee; R. S. Rawat
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Paper Abstract

Fast miniature plasma focus (FMPF-3), a low energy (235 J) device, is an attractive option for being a potential source for soft X-ray (SXR) (0.9 – 1.6 keV) lithography due to its smaller X-ray generation spot size and the capability of being a high repetition source. As a continuation of our work on the enhancement of SXR emission from this device, in present investigation the insulator sleeve length is optimized for efficient SXR emission. It plays a major role in the current sheath formation, which is determinant of the efficient compression and the consequent radiation emission. The influence of the presence or absence of cathode rods on the SXR emission is also investigated. It is one least explored parameter although it plays a major role in the determination of plasma sheath curvature which in turn influences the dynamic plasma inductance and the magnetic flux associated with moving current sheath. Another major highlight of this study is the time resolved laser shadowgraphy of the plasma sheath dynamics to understand the influence of the variation of these parameters on it. Through optimization of the insulator sleeve length, the highest ever obtained SXR yield of 1.8 J/shot was achieved for this device.

Paper Details

Date Published: 5 September 2014
PDF: 12 pages
Proc. SPIE 9207, Advances in X-Ray/EUV Optics and Components IX, 92070P (5 September 2014); doi: 10.1117/12.2062549
Show Author Affiliations
S. M. P. Kalaiselvi, Nanyang Technological Univ. (Singapore)
T. L. Tan, Nanyang Technological Univ. (Singapore)
A. Talebitaher, Nanyang Technological Univ. (Singapore)
P. Lee, Nanyang Technological Univ. (Singapore)
R. S. Rawat, Nanyang Technological Univ. (Singapore)


Published in SPIE Proceedings Vol. 9207:
Advances in X-Ray/EUV Optics and Components IX
Christian Morawe; Ali M. Khounsary; Shunji Goto, Editor(s)

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