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Proceedings Paper

Optical characterization of CMOS compatible micro optics fabricated by mask-based and mask-less hybrid lithography
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Paper Abstract

We report a CMOS compatible fabrication and optical characterization of the micrometer scale optical coupler, a 45° mirror-based optical coupler for inter-layer optical coupling. A newly proposed mask-based and mask-less hybrid lithography process enables accurate surface profile of the micrometer sized 45° mirror by using a CMOS compatible buffer coat material. Surface profile inspected by an optical interferometry agrees well with SEM based inspection results. Experimental and theoretical results for routing and coupling of laser beam in 90° will be discussed.

Paper Details

Date Published: 15 September 2014
PDF: 6 pages
Proc. SPIE 9170, Nanoengineering: Fabrication, Properties, Optics, and Devices XI, 91700F (15 September 2014); doi: 10.1117/12.2062414
Show Author Affiliations
Sunglin Wang, College of Optical Sciences, The Univ. of Arizona (United States)
Chris Summitt, College of Optical Sciences, The Univ. of Arizona (United States)
Lee Johnson, College of Optical Sciences, The Univ. of Arizona (United States)
Melissa Zaverton, College of Optical Sciences, The Univ. of Arizona (United States)
Tom Milster, College of Optical Sciences, The Univ. of Arizona (United States)
Yuzuru Takashima, College of Optical Sciences, The Univ. of Arizona (United States)


Published in SPIE Proceedings Vol. 9170:
Nanoengineering: Fabrication, Properties, Optics, and Devices XI
Eva M. Campo; Elizabeth A. Dobisz; Louay A. Eldada, Editor(s)

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